Materials Chemistry
I am interested in the application of organometallic chemistry to
various aspects of materials science. Recent studies have focused
on the chemical vapor deposition (CVD) of a variety of different materials
of interest to the electronics industry, e.g., GaAs, TiN, GaN, and
the platinum group metals Rh, Ru, Ir, and Pt. The bis-CF3
substituted ligand 3,5-bis(trifluoromethyl)pyrazolate should impart increased
volatility and novel properties to precursor molecules. Here are a couple
of such precursors for the CVD of high purity thin films of the corresponding
metals under mild conditions.
